The influence of the oxidation method on the properties of reduced graphene oxide

Authors

  • Łukasz Drewniak Optoelectronics, Faculty of Electrical Engineering, Silesian University of Technology, 2 Krzywoustego St. 44-100 Gliwice, Poland http://orcid.org/0000-0003-4745-3069
  • Sabina Drewniak Optoelectronics, Faculty of Electrical Engineering, Silesian University of Technology, 2 Krzywoustego St. 44-100 Gliwice, Poland

DOI:

https://doi.org/10.4302/plp.v14i3.1154

Keywords:

reduced graphene oxide, atomic force microscopy

Abstract

Derivatives of graphene have become important materials due to their excellent properties. Graphene oxide and reduced graphene oxide are especially interesting because they are produced relatively easily, cheaply and quickly. Among many possible applications, reduced graphene oxide is a good candidate for sensor applications. Its properties can be controlled at the production stage. The precursor used and the method of oxidation have a significant influence on its properties. Therefore, it is worth take a closer look at them. In this paper we analyse the influence of the oxidation method on the size of the reduced graphene stock which determine the sensitivity of the rGO layer. We used AFM microscopy for this purpose.

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References
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Published

2022-09-30

How to Cite

[1]
Łukasz Drewniak and S. Drewniak, “The influence of the oxidation method on the properties of reduced graphene oxide”, Photonics Lett. Pol., vol. 14, no. 3, pp. 47–49, Sep. 2022.

Issue

Vol. 14 No. 3 (2022)

Section

Articles

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