Extreme ultraviolet and soft X-ray imaging using compact laser-plasma sources based on a double stream gas-puff target

Przemysław Wojciech Wachulak, Andrzej Bartnik, Jerzy Kostecki, Łukasz Węgrzyński, Tomasz Fok, Roman Jarocki, Mirosław Szczurek, Henryk Fiedorowicz

Abstract


New developments in science and technology require imaging tools and techniques capable of imaging with increased contrast and high spatial resolution, such as an extreme ultraviolet (EUV) and soft X-ray (SXR) microscopy. In this paper, we report on our recent activities related to various imaging techniques in the EUV and SXR region of electromagnetic spectrum, employing a double stream gas-puff target source. Those techniques has been successfully used for studies of morphology of thin silicon membranes coated with NaCl crystals, samples composed of ZnO nanofibers and biological samples.

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Photonics Letters of Poland - A Publication of the Photonics Society of Poland
Published in cooperation with SPIE

ISSN: 2080-2242