Aberration generators in tandem

Jorge Ojeda Castaneda, Ana L. Barragán-Chávez, Cristina M. Gómez-Sarabia

Abstract


We discuss the use of a pair of phase masks, which have both radial and helical variations, for optically implementing wavefront aberration generator. We show that by using these masks one can change continuously the aberration coefficients of both symmetric and asymmetric aberrations. Some numerical simulations illustrate our proposed procedure.

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Photonics Letters of Poland - A Publication of the Photonics Society of Poland
Published in cooperation with SPIE

ISSN: 2080-2242