An interferometric test station for massive parallel inspection of MEMS and MOEMS
DOI:
https://doi.org/10.4302/photon.%20lett.%20pl.v1i2.27Abstract
The paper presents the optical, mechanical, and electro-optical design of an interferometric inspection system for massive parallel inspection of Micro(Opto)ElectroMechanicalSystems (M(O)EMS). The basic idea is to adapt a micro-optical probing wafer to the M(O)EMS wafer under test. The probing wafer is exchangeable and contains a micro-optical interferometer arrays. Two preliminary interferometer designs are presented; a low coherent interferometer array based on a Mirau configuration and a laser interferometer array based on a Twyman-Green configuration. The optical design focuses on the illumination and imaging concept for the interferometer array. The mechanical design concentrates on the scanning system and the integration in a standard test station for micro-fabrication. The smart-pixel approach for massive parallel electro-optical detection and data reduction is discussed.Downloads
Published
2009-06-29
How to Cite
[1]
M. Kujawinska, K. Gastinger, M. Jozwik, K. H. Haugholt, C. Schaeffel, and S. Beer, “An interferometric test station for massive parallel inspection of MEMS and MOEMS”, Photonics Lett. Pol., vol. 1, no. 2, pp. pp. 58–60, Jun. 2009.
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