Preparation of porous TiO2 films by means of pulsed laser deposition for photocatalytic applications

Authors

  • Anna Iwulska Polish Academy of Sciences, IF-FM, Photophysics Dpt.
  • Gerard Śliwiński Polish Academy of Sciences, IF-FM, Photophysics Dpt.

DOI:

https://doi.org/10.4302/photon.%20lett.%20pl.v3i3.215

Abstract

In this work the preparation and structure properties of porous thin films of TiO2 were investigated. The films were produced by means of the pulsed laser deposition technique using laser pulses at 266nm (10Hz) and at fluencies of 1–3.5J/cm2. The process was performed in vacuum using O2 buffer gas and films were deposited on the SiO2 glass or Si substrate. X-ray diffraction (XRD) and Raman analysis of the structure and chemical composition of the obtained samples confirmed the presence of both anatase and rutile phase. For the O2 pressure applied above 10-2 hPa, the anatase bands were observed and below this value, rutile bands dominated in the Raman spectra in agreement with XRD data.
 
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Published

2011-09-29

How to Cite

[1]
A. Iwulska and G. Śliwiński, “Preparation of porous TiO2 films by means of pulsed laser deposition for photocatalytic applications”, Photonics Lett. Pol., vol. 3, no. 3, pp. pp. 98–100, Sep. 2011.

Issue

Vol. 3 No. 3 (2011)

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Articles

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